Mfg
Cat
Model
Asset No.
Description
Qty
Price ($)
Delivery (wks)
Image
Refurbished products list - Please contact Axic Inc Sales department for any inquiries about the products listed here
Mfg |
Cat |
Model |
Asset No. |
Description |
Qty |
Price ($) |
Delivery (wks) |
Image |
| Advanced Plasma | Asher | 2800 | 30251 | Large area asher Condition: AS IS | 1 | 10,000 | stock | |
| Airco Temescal | Sputterer | VES 2550 | 30244 | DC sputterer 2 Targets Metal sputtering system Condition: AS IS | 1 | 20,000 | stock | |
| Alcatel | Pump | 2033C | 30169 | Mechanical pump Condition: rebuilt | 1 | 3,250 | 2 | |
| AnnealSys | RTP | AS One 150 | 80119 | Benchtop RTP system for wafers up to 6 inches dia. Condition: NEW | 1 | 69,000 | stock | |
| ASM | Etcher | Nitrox fumer | 30098 | Two tubes chemical vapor etcher Condition: As Is (parts - machine) | 1 | 1,000 | stock | |
| AXIC | Metrology | Tyger | Multi-angle laser reflectometer Up to 6 inch wafers Vintage: 1990 Condition: rebuilt | 1 | 20,000 | stock | |
|
| AXIC | Plasma | MultiMode HF8 | 30209 30210 | Plasma photoresist stripper/cleaner | 2 | 25,000 | 2 | |
| AXIC | RIE/Asher | MultiMode HF8 | 30232 30233 | Plasma tool for anisotropic and/or isotropic etch Condition: operational | 2 | 29,000 | 10 | |
| AXIC | Etcher | Plasmaster | 30331 | RIE System, 12" dia. electrode, 4 MFCs, turbo pumped, laser end point detection, PC controlled | 1 | 69,000 | 6 | |
| AXIC | XRF | AXIC 100-II | 30023 | XRF thin film measurement system WDX and EDS spectrometers 8 inch capability Set up for Wt% P in PSG Condition: operational | 1 | 59,000 | 4 | |
| AXIC | XRF | Precision 1000 | 30311 | XRF thin film measurement system. Condition: refurbished | 1 | 99,900 | stock | |
| Busch | Pump | CS0102/WY0250 | 30343 | Busch Pump / Blower Pumping Package, Dry Mechanical CS 0102, Blower WY 0250, Power control box, 220V, 3 Phase, As-Is | 1 | 1,500 | stock | |
| Denton | Sputter | Desk I | 30340 | Sputter coater for SEM specimens. Has a 2 inch target. Includes Alcatel vacuum pump | 1 | 2,500 | 2-3 | |
| Edwards | Pump | E2M 80 / EH500 blower | 30181 | E2M-80 mechanical pump EH500 roots blower Charged with fomblin oil for corrosive use Condition: rebuilt | 1 | 8,000 | stock | |
| Forma Scientific | Chiller | 2095 | Bath and circulator. 115V, 1 Phase, 2 wire, 12 FLA | 2 | 900 | stock | ||
| Kevex | XRF | Omicron | 30196 | XRF system with small spot Condition: AS IS | 1 | 8,000 | stock | |
| Koolant Kooler | Chiller | WX 1000 NF-HC | 30341 | Heater/Chiller 1 Ton, 12,000 BTU S/N 3339. Air cooled. 220V, 6.5 Amps, R-12 Refrigerant | 1 | 1000 | stock | |
| Leybold | Pump | D40 BCS | 30335 | D40 BCS Leybold pump with filters and Fomblin oil Condition: New | 1 | 10,000 | stock | |
| Leybold | Pump | D65BCS/WSU151 | 30,334 | Leybold D65 BCS Pump with WSU 151 blower package with controller and filters. Fomblin oil in pump and blower | 1 | 10,000 | stock | |
| Leybold | Pump | D65 BCS | D65 BCS mechanical pump for corrosive use | 6 | 2,500 | stock | ||
| Leybold | Pump | D30A | 30227 30228 30229 30230 | Pump with mist eliminator Vintage: 1992 Condition: rebuilt or as is | 4 | 3,250 (rebuilt) 2,000 (as is) | stock | |
| Neslab | Chiller | CFT-33 | 30257 | Chiller | 1 | 1,250 | stock | |
| Neslab | Chiller | HX-75 | 30259,30260 | Chiller | 2 | 1,750 | stock | |
| Neslab | Chiller | HX-150 | 30292 | Chiller | 1 | 1,500 | stock | |
| Nova Pure | Gas handling | 200 | 30248 | Gas scrubber - Condition: AS IS | 1 | 5,000 | stock | |
| Oxford | PECVD | 30344 | uP-80 PECVD System | PECVD System, up to 8" wafers. MFCs for N2, SiH4, N20, PH3, Freon-O2 Mix. Deposits H2 Si (non-doped, doped), SiN and SiO2 and Si. Includes: turbo molecular pump (Alcatel 5150-CP), Leybold WAU251 roots blower, Leybold rotary vane mechanical pump (D40B) | 1 | 49,900 | 8 | |
| Oxford | RIE | 30345 | uP-80 RIE System | RIE system processes wafers up to 8" dia. Excellent for RIE of SiO2, Si3N4, Si, photoresist and polyimides. Parallel plate electrodes, MFCs: O2, Ar, N2, SF6, CF4, H2. Turbo molecular pump, 208V - 3 phase | 1 | 39,900 | 8 | |
| Plasma Sciences | Sputterer | HRC 200 | 30202 | Bench top sputtering system Turbo pump 8 inch capability Condition: AS IS | 1 | 5,000 | stock | |
| PlasmaTherm | RIE | 2480 | 30064 | RIE S/N E603007 Leybold Turbovac 450 Leybold Turbo controller Planetaries capacity (# wafers) 2-3 inch Al (25) 1-3 inch plastic (25) 1-4 inch plastic (12) Chamber diameter - 2 feet Remote controller - S/N 861639 Plasma endpoint detector 210 Condition: As is | 1 | 15,000 | stock | |
| Ramco | Asher | Ram 5 | 30249 | Asher Condition: AS IS | 1 | 5,000 | stock | |
| Rigaku | XRF | 3613A | 30020 | XRF thin film thickness measurement system Condition: As is (parts - machine) | 1 | 2,000 | stock | |
| Rigaku | XRF | 3710A | 30162 | XRF thin film thickness measurement system Condition: As is (parts - machine) | 1 | 2,000 | stock | |
| Rigaku | XRF | 3725 | 30174 | TXRF system with Horiba detector for measuring contamination on wafers Condition: As is - missing computer | 1 | 2,000 | stock | |
| Semigas | Gas handling | . | 30171 30172 | Gas cabinet Single bottle Condition: empty | 2 | 200 | stock | |
| Technics | Asher | Plasma Excitor 3000-1 | 30004 | Plasma desmearing or surface treatment system Vacuum pump with blower Condition: As is | 1 | 5,000 | 2 | |
| Technics | Etcher | 8800 Benchtop | 30332 | Parallel Plate Reactive Ion Etch System, 17" dia electrodes, 2MFC controlled gas lines, 30 KHz power supply, benchtop system, 110V, 50/60Hz | 1 | 25,900 | 6 | |
| Technics | Etcher | 8800 | 30333 | Parallel Plate Reactive Ion Etch Floor Mounted System with pneumatic operated chamber hoist, 17" dia. electrodes, 2 MFC controlled gas lines, 40 KHz power supply, 220V, 50/60Hz | 1 | 29,900 | 6 | |
| TEL | Etcher | 580 LC | 30247 | RIE Etcher for 6" wafers Condition: AS IS | 1 | 5,000 | stock | |
| YES | Plasma | R3 | 30342 | Plasma System, YES/Glen R3A plasma system. Has 2 sets of shelves for processing. Advanced Energy PE-1000 30 KHz, 1000 watt power supply, 2 gas inlets. Granville Phillips 275 convection vacuum gauge, 8 CFM mechanical vacuum pump. Ideal for cleaning applications such as packages or lead frames | 1 | 24,900 | 4 | |