PRECISION 1000-B®
A Production Line Thin Film Composition and Thickness Monitor
The
Precision 1000-B® readily analyzes compound thin films utilized in
semiconductor, superconductor, magnetic and optical applications.
This
fully automatic system provides rapid composition and thickness
analysis of films in the production environment. In process
development, the Precision 1000-B® is utilized to characterize the
effect of variables on the film deposition process. Once the process is
defined, the Precision 1000-B® is utilized as a quality control monitor
to insure the composition and thickness of the production films.
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- Au, Ta, Cu
- P in PSG/BPSG
- Si and Cu in Aluminum
- W in WSix
- Ti in TiW,TiN
- Mo in MoSi
- Ti-Ni-Ag -- film stack
- Cr-Ni-Au -- film stack
- Ti-Ag-Au -- film stack
- Cu, Ba and Y in Superconducting Films
- Co, Ni and Fe in Magnetic Films
- CoCr, CoPt, CoTa Magnetic Films
- Many others! Ask for your application
System Description
The
Precision 1000-B® XRF-WDS/EDS System utilizes a helium environment
spectrometer, thus eliminating the vacuum requirement and greatly
improving system reliability. Most analyses are performed using the
wavelength dispersive spectrometer (WDS), giving high precision
measurements. For some applications, the energy dispersive (EDS)
spectrometer is used simultaneously with WDS to optimize analysis time
e.g. thick silver films (20,OOOÅ - 30,OOOÅ) on Ti-Ni. Features include
- Liquid Cooled - Rhodium (or Tungsten) Target X-Ray Tube with Recirculator
- 30 kV - 20 mA Fully Regulated Feedback Controlled X-Ray Power Supply
- Helium Environment Spectrometer with Low Delta Pressure, allowing the use of a Large Detector Window for Analysis
- Wafer Remains In Air
- Simultaneous XRF-WDS/EDS Analysis
- Proportional Counter Detectors Provide High Sensitivity and Do Not Require LN2
- Pentium PC-Based System for System Control, Analysis, and Data Display
- Computerized detector, amplifier and discriminator electronics for optimum analysis
- Accepts Wafers to 8 inches in diameter (12 inch optional)
- Fast Analysis
- Compact System
- Internal Reference Calibration
- No Preventive Maintenance Required
- Excellent Energy Resolution (15eV) - Total separation of P from Si in PSG/BPSG
- Simple Operation
- Complete System Under Computer Control
- Fast A to D Converter
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 AXIC Precision 1000-B® Thin Film Analysis System
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The Precision 1000-B® system is employed for the precise rapid
measurement of thin films for composition and thickness
non-destructively. The system is compact in design, easily operated,
and convenient in operation. The unit is composed of the following: |
X-Ray Spectrometer
Two
spectrometers are provided. The first is a WDX unit capable of being
operated with two crystals (standard PET and LiF - others are
available). Primary and secondary collimators are employed to properly
collimate the X-ray beam from the sample to the X-ray detector. A
sealed Xe proportional counter is utilized. The spectrometer is varied
in angle to conform to the Bragg equation for desired wavelengths. The
spectrometer is fully automated selecting the appropriate crystal for
the desired analysis and also selecting the predefined Bragg angle for
the specific analysis.
The second spectrometer is of the EDX design and employs a single collimator with a PIN Diode Detector
Other combinations are available with one or more fixed WDS channels for the ultimate in speed and reproducibility.
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Spectrometer Chamber
The
He purged spectrometer is manufactured from steel and is nickel plated.
The unit is fully shielded against all X-rays. The chamber provides for
egress
and ingress of the X-ray beam through a thin film shuttered window.
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X-Ray Power Supply - 30kV - 20 mA
Solid
state, fully stabilized. Provides electron beam current
measurement/feedback for stable X-ray flux. This supply is fully
computer controlled with automatic menu set up.
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X-RayTube - 30kV - 20 mA
Rhodium
Target-Beryllium side mounted window (other targets are available). The
tube is liquid cooled. A recirculator is provided for cooling the tube.
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Signal Conditioner
An
analog to digital converter is employed with a preamp and amplifier.
Two data channels are processed simultaneously. This unit also includes
the high voltage driver for the X-ray detectors. This unit is fully
computer controlled and is set tip automatically from the menu.
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Computer
A
Pentium Computer is employed for data entry and data logging. This unit
is equipped with a hard drive, 8 meg DRAM, inkjet printer and a
clock-calendar. Complete operating software utilizing multiple display
windows for equipment setup, status, data reporting, SPC, etc. is
provided. The software allows the entry of sample I.D. and process I.D;
all analysis data is reported on the screen and stored to disk for
in-situ analysis and statistical process control including standard
deviation, max., min., and range. A GEM/SECS II package is available
for connection to, and control by a host computer.
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Automated Sample Stage
This
allows the sequential measurement of up to 25 points on a wafer and up
to 18 pre-programmed maps can be stored and automatically recalled.
Other programs can be entered at will. The stage opens and closes
automatically. Mapping data is reported to screen and printer. The
stage employs pneumatic operation
for long term reliability.
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Dimensions
Width 20" x Depth 30" x Height 72"
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Utility
| Power | 15Amps - 11OVolts - 50/60Hz |
| 7.5 Amps - 220 Volts - 50/60 Hz |
| Customer Selected |
| Gas | Helium - 99.95% Pressure Reduced |
| Air | 20-40 psi (stage operation) |
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Sample Holder
One supplied, customer selects: 2", 3", 4", 5", 6" or 8" diameter (12" optional) special sample holders available on request.
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Other X-Ray Systems from AXIC
- AXIC 100-II Benchtop XRF system
- Precision 1000-II fully automated "SMIF" XRF system with robot handling
- Precision 1000-III fully automated cassette - to cassette XRF system
- X-CALIBER Rapid X-Ray Refectometer for thin film thickness, density and surface microroughness
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