MULTIMODE Electrode Configurations

Modular Electrodes For Use With Axic's MULTIMODE® Series Plasma Systems

Axic's MultiMode Plasma Processing Systems, through the use of easily insertable electrodes, provide a versatility not found on any other plasma system. Each electrode style is mounted on a seal plate and is inserted into the rear of the plasma chamber. The seal plate is then attached to the chamber through the use of thumbscrews and sealed via an o-ring seal. It only takes a few minutes to completely change the plasma process by changing the electrode configuration.

The available electrode configurations, Reactive Ion Etching (RIE) and Cage provide the user with a wide variety of plasma processing capabilities within one cost effective system. These processes ange from sophisticated RIE processing to surface cleaning and material modification. All MultiMode systems are designed with easily interchangeable chamber modules available in a variety of materials. You may select from Aluminum, Anodized Aluminum or 304 SST for chemistry or process compatibility. All chamber modules are designed to accept any electrode configuration providing a system designed for the users specific processing requirement. Axic's MultiMode interchangeable electrode concept is described in detail as follows:

RIE Electrode Configurations

This electrode configuration allows the user to perform sophisticated Reactive Ion Etching and Planar Plasma Etching. The electrodes consist of two rectangular water cooled parallel plates. The upper electrode contains an easily removable gas showerhead for uniform gas dispersion.

Features

• Temperature Controlled
• Electrodes
• 304 SST Construction
• 13.56 MHz RF Power
• Removable Gas Showerhead
• Quartz or Graphite Cathode
• Cover Plates
• Either Electrode Can Be RF Powered

Applications

• RIE Etching
• Failure Analysis
• Descumming
• Delineation
• Material Modifications

CAGE Electrode Configurations

This electrode configuration allows the user to "batch process" substrates for a wide variety of plasma applications. The electrode consists of a cylindrical tube (cathode) of perforated aluminum in which the substrates are placed. The plasma is generated between this tube and the chamber wall. Process gas is admitted to the chamber via a gas dispersion tube running the length of the chamber.

Features

• Large Processing Area
• Uniform Plasma Generation
• Uniform Gas Dispersion
• 13.56 MHz RF Power

Applications

• Photoresist Str ipping
• Descumming
• Surface Modification
• Substrate Cleaning
• Biomedical Applications

TRAY Electrode Configurations

This electrode configuration allows the user to process flat subtrates, in a horizontal position, on a series of shelves that can either be at ground potential or RF powered. Process gas is admitted to the chamber via a gas dispersion tube running the length of the chamger.

Features

• Substrates Grounded or RF Powered
• Multiple Trays for Larger Process Area
• Horizontal Processing for Uniformity
• Unifform Gas Dispersion
• 40 KHz or 13.56 MHz RF Power

Applications

• Descumming
• Hybird Clearning
• Surface Treatment & Modification
• Adhesion Promotion
• Biomedical Applications