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Introducing the ‘NEW" Iso-Lok 200 |
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Saturday, 25 August 2007 |
Introducing the ‘NEW" Iso-Lok 200® ICP ETCH and DEPOSITION SYSTEM
THE AFFORDABLE
HIGH-PERFORMANCE
DRIE
AND LOW TEMPERATURE
PECVD
PLASMA PROCESSING SYSTEM
The
AXIC Iso-Lok 200®
Inductively
Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a
new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low
damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma
processing. The system is based on a modular design starting with a universal
chamber and cabinet unit with ICP etch and deposition bottom electrodes
available for easy installation into the chamber unit combined with a
load-lock. We are confident you will find the ease of use, variety of plasma
processes, serviceability and attractive pricing of the AXIC Iso-Lok 200® unsurpassed by any other plasma product in the market.
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Sunday, 04 March 2007 |
MARCH 2007
Location:
Shanghai, China
Shanghai New International Exhibition Centre (SNIEC) Shanghai, China
EXHIBIT HOURS:
Wednesday, March 21-10:00 am to 6:00 pm
Thursday, March 22-10:00 am to 6:00 pm
Friday, March 23 - 10:00am to 6:00 pm
Visitor
can register for fee admission by going to: www.semi.org/semiconchina
AXIC
will be represented by:
"Saratoga
Technologies", Hall E4, Booth # 4666 &
"Luva
Systems", Hall E4, Booth # 4130
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Semicon West 2007 San Francisco, CA |
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Sunday, 04 March 2007 |
July 2007
Moscone Center
‘Semicon West is the premier trade
show in the world for the
Semiconductor Industry, MEMS,
Nanoelectronics, Solar and Fuel Cells,
Advanced packaging, Sub-32 micron
manufacturing, Assembly and Test'
Location:
Moscone Center (South Hall)
800 Howard Street
San Francisco,
CA 94103
EXHIBIT HOURS:
Tuesday, July 17 -- 10:00 am to 6:00 pm
Wednesday, July 18 -- 10:00 am to 6:00 pm
Thursday, July 19 -- 10:00 am to 5:00 pm
Visitors can register for free admission by going to www.semiconwest.org
Please
visit AXIC Inc. at Booth # 1311, South Hall
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